Goldberg, Kenneth: search on Z-Library

The world's largest scientific articles store. 70,000,000+ articles for free.

1

The Dynamics of Shame: A Roundtable Discussion

Erskine, Richard G., Clark, Barbara, Evans, Kenneth R., Goldberg, Carl, Hyams, Hanna, James, Samuel, O'Reilly-Knapp, Marye

Journal:

Transactional Analysis Journal

Year:

1994

Language:

english

File:

PDF, 778 KB

english, 1994

2

Being Contemporary

Wilson, Robert, Bernstein, Charles, Goldberg, Roselee, Gerard, Brennan, Kelly, Ryan, Nevarez, Angel, Tevere, Valerie, Collins, Kenneth, Weintraub, Linda, Lyons, Robert, Paraiso, Nicky, Stokić, Jovana,

Journal:

PAJ A Journal of Performance and Art

Year:

2012

Language:

english

File:

PDF, 388 KB

english, 2012

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Performance of 250W high-power HVM LPP-EUV source

Panning, Eric M., Goldberg, Kenneth A., Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Sh

Year:

2017

Language:

english

File:

PDF, 2.03 MB

english, 2017

4

Dysphagia in Stroke, Neurodegenerative Disease, and Advanced Dementia

Altman, Kenneth W., Richards, Amanda, Goldberg, Leanne, Frucht, Steven, McCabe, Daniel J.

Journal:

Otolaryngologic Clinics of North America

Year:

2013

Language:

english

File:

PDF, 289 KB

english, 2013

5

How the brain deals with novelty and ambiguity: implications for neuroaesthetics

Elkhonon Goldberg, Brent A. Funk, Kenneth Podell

Journal:

Rendiconti Lincei

Year:

2012

Language:

english

File:

PDF, 410 KB

english, 2012

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Exploring the readiness of EUV photo materials for patterning advanced technology nodes

Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Vesters, Yannick, Shehzad, Atif, Vandenberghe, Geert, Foubert, Philippe, Beral, Christophe, Van den Heuvel, Dieter, Mao, Ming, Lazzarino, Fre

Year:

2017

Language:

english

File:

PDF, 2.70 MB

english, 2017

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Patterning performance of chemically amplified resist in EUV lithography

Panning, Eric M., Goldberg, Kenneth A., Fujii, Tatsuya, Matsumaru, Shogo, Yamada, Tomotaka, Komuro, Yoshitaka, Kawana, Daisuke, Ohmori, Katsumi

Year:

2016

Language:

english

File:

PDF, 762 KB

english, 2016

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs

Panning, Eric M., Goldberg, Kenneth A., Kim, Ryoung-Han, Wood, Obert, Crouse, Michael, Chen, Yulu, Plachecki, Vince, Hsu, Stephen D., Gronlund, Keith

Year:

2016

Language:

english

File:

PDF, 780 KB

english, 2016

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance

Panning, Eric M., Goldberg, Kenneth A., Konda, Akihiro, Yamamoto, Hiroki, Yoshitake, Shusuke, Kozawa, Takahiro

Year:

2016

Language:

english

File:

PDF, 327 KB

english, 2016

10

Independence of depersonalization-derealization.

Fleiss, Joseph L., Gurland, Barry J., Goldberg, Kenneth

Journal:

Journal of Consulting and Clinical Psychology

Year:

1975

Language:

english

File:

PDF, 159 KB

english, 1975

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Progress in EUV lithography toward manufacturing

Panning, Eric M., Goldberg, Kenneth A., Kim, Seong-Sue, Chalykh, Roman, Kim, Hoyeon, Lee, Seungkoo, Park, Changmin, Hwang, Myungsoo, Park, Joo-On, Park, Jinhong, Kim, Hocheol, Jeon, Jinho, Kim, Insung

Year:

2017

Language:

english

File:

PDF, 1.36 MB

english, 2017

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV patterning successes and frontiers

Panning, Eric M., Goldberg, Kenneth A., Felix, Nelson, Corliss, Dan, Petrillo, Karen, Saulnier, Nicole, Xu, Yongan, Meli, Luciana, Tang, Hao, De Silva, Anuja, Hamieh, Bassem, Burkhardt, Martin, Mignot

Year:

2016

Language:

english

File:

PDF, 4.93 MB

english, 2016

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel metal containing resists for EUV lithography extendibility

Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Sayan, Safak, Dei, Satoshi, Pollentier, Ivan, Kuwahara, Yuhei, Vandenberghe, Geert, Nafus, Kathleen, Shiratani, Motohiro, Nakagawa, Hisashi,

Year:

2016

Language:

english

File:

PDF, 1.28 MB

english, 2016

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - The future of EUV lithography: enabling Moore's Law in the next decade

Panning, Eric M., Goldberg, Kenneth A., Pirati, Alberto, van Schoot, Jan, Troost, Kars, van Ballegoij, Rob, Krabbendam, Peter, Stoeldraijer, Judon, Loopstra, Erik, Benschop, Jos, Finders, Jo, Meiling,

Year:

2017

Language:

english

File:

PDF, 10.99 MB

english, 2017

15

HOW OLD DO YOU WANT TO BE?

Kenneth P. Goldberg

Journal:

Teaching Children Mathematics

Year:

1994

Language:

english

File:

PDF, 1.74 MB

english, 1994

16

CURVE STITCHING IN AN ELEMENTARY CALCULUS COURSE

KENNETH P. GOLDBERG

Journal:

Mathematics Teacher

Year:

1976

Language:

english

File:

PDF, 457 KB

english, 1976

17

Predictors of Success in Individuals with Learning Disabilities: A Qualitative Analysis of a 20-Year Longitudinal Study

Roberta J. Goldberg, Eleanor L. Higgins, Marshall H. Raskind, Kenneth L. Herman

Journal:

Learning Disabilities Research & Practice

Year:

2003

Language:

english

File:

PDF, 154 KB

english, 2003

18

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - NXE pellicle: offering a EUV pellicle solution to the industry

Panning, Eric M., Goldberg, Kenneth A., Brouns, Derk, Bendiksen, Aage, Broman, Par, Casimiri, Eric, Colsters, Paul, Delmastro, Peter, De Graaf, Dennis, Janssen, Paul, van de Kerkhof, Mark, Kramer, Ron

Year:

2016

Language:

english

File:

PDF, 1.60 MB

english, 2016

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Novel EUV mask black border and its impact on wafer imaging

Panning, Eric M., Goldberg, Kenneth A., Kodera, Yutaka, Fukugami, Norihito, Komizo, Toru, Watanabe, Genta, Ito, Shin, Yoshida, Itaru, Maruyama, Shingo, Kotani, Jun, Konishi, Toshio, Haraguchi, Takashi

Year:

2016

Language:

english

File:

PDF, 995 KB

english, 2016

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Absorption and exposure kinetics of photoresists at EUV

Panning, Eric M., Goldberg, Kenneth A., Fallica, Roberto, Haitjema, Jarich, Wu, Lianjia, Castellanos, Sonia, Brouwer, Fred, Ekinci, Yasin

Year:

2017

Language:

english

File:

PDF, 703 KB

english, 2017

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Influence of post exposure bake time on EUV photoresist RLS trade-off

Panning, Eric M., Goldberg, Kenneth A., Vesters, Yannick, De Simone, Danilo, De Gendt, Stefan

Year:

2017

Language:

english

File:

PDF, 780 KB

english, 2017

22

ASSET SECURITIZATION AND CORPORATE FINANCIAL HEALTH

Goldberg, Harold H., Burke, Robert W., Gordon, Samuel, Pinkes, Kenneth J. H., Watson, M. Dough

Journal:

Journal of Applied Corporate Finance

Year:

1988

Language:

english

File:

PDF, 80 KB

english, 1988

23

Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach

Upadhyaya, Mihir, Jindal, Vibhu, Basavalingappa, Adarsh, Herbol, Henry, Harris-Jones, Jenah, Jang, Il-Yong, Goldberg, Kenneth A., Mochi, Iacopo, Marokkey, Sajan, Demmerle, Wolfgang, Pistor, Thomas V.,

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 5.09 MB

english, 2015

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Demonstration of an N7 integrated fab process for metal oxide EUV photoresist

Panning, Eric M., Goldberg, Kenneth A., De Simone, Danilo, Mao, Ming, Kocsis, Michael, De Schepper, Peter, Lazzarino, Frederic, Vandenberghe, Geert, Stowers, Jason, Meyers, Stephen, Clark, Benjamin L.

Year:

2016

Language:

english

File:

PDF, 1.59 MB

english, 2016

25

Image-based pupil plane characterization via a space-domain basis

Levinson, Zac, Burbine, Andrew, Verduijn, Erik, Wood, Obert, Goldberg, Kenneth A., Benk, Markus P., Wojdyla, Antoine, Smith, Bruce W.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 3.52 MB

english, 2017

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection

Panning, Eric M., Goldberg, Kenneth A., Bonam, Ravi K., Tien, Hungyu, Chou, Acer, Meli, Luciana, Halle, Scott D., Wu, Ivy, Huang, Xiaoxia, Lei, Chris, Kuan, Chiyan, Wang, Fei, Corliss, Daniel A., Fang

Year:

2016

Language:

english

File:

PDF, 926 KB

english, 2016

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Quantitative evaluation of mask phase defects from through-focus EUV aerial images

Mochi, Iacopo, La Fontaine, Bruno M., Naulleau, Patrick P., Goldberg, Kenneth A., Xie, Ryan, Yan, Pei-Yang, Yamazoe, Kenji

Year:

2011

Language:

english

File:

PDF, 3.97 MB

english, 2011

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

La Fontaine, Bruno M., Huh, Sungmin, Ren, Liping, Chan, David, Wurm, Stefan, Goldberg, Kenneth, Mochi, Iacopo, Nakajima, Toshio, Kishimoto, Masahiro, Ahn, Byungsup, Kang, Inyong, Park, Joo-on, Cho, Ky

Year:

2010

Language:

english

File:

PDF, 977 KB

english, 2010

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Technology for defectivity improvement in resist coating and developing process in EUV lithography process

Panning, Eric M., Goldberg, Kenneth A., Kamei, Yuya, Shiozawa, Takahiro, Kawakami, Shinichiro, Shite, Hideo, Ichinomiya, Hiroshi, Enomoto, Masashi, Nafus, Kathleen, Demand, Marc, Foubert, Philippe

Year:

2017

Language:

english

File:

PDF, 365 KB

english, 2017

30

Broader view on extreme ultraviolet masks: adding complementary imaging modes to the SHARP microscope

Benk, Markus P., Miyakawa, Ryan H., Chao, Weilun, Wang, Yow-Gwo, Wojdyla, Antoine, Johnson, David G., Donoghue, Alexander P., Goldberg, Kenneth A.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 5.06 MB

english, 2015

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes

Panning, Eric M., Goldberg, Kenneth A., Gronheid, Roel, Boeckx, Carolien, Doise, Jan, Bekaert, Joost, Karageorgos, Ioannis, Ruckaert, Julien, Chan, Boon Teik, Lin, Chenxi, Zou, Yi

Year:

2016

Language:

english

File:

PDF, 1.05 MB

english, 2016

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV process establishment through litho and etch for N7 node

Panning, Eric M., Goldberg, Kenneth A., Kuwahara, Yuhei, Kawakami, Shinichiro, Kubota, Minoru, Matsunaga, Koichi, Nafus, Kathleen, Foubert, Philippe, Mao, Ming

Year:

2016

Language:

english

File:

PDF, 442 KB

english, 2016

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Etched-multilayer black border formed on EUV mask: Does it cause image degradation during pattern inspection using EB optics?

Panning, Eric M., Goldberg, Kenneth A., Amano, Tsuyoshi, Iida, Susumu, Hirano, Ryoichi, Abe, Tsukasa, Morikawa, Yasutaka, Watanabe, Hidehiro

Year:

2016

Language:

english

File:

PDF, 1.28 MB

english, 2016

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - High-volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

Panning, Eric M., Goldberg, Kenneth A., Sayan, Safak, Vanelderen, Pieter, Hetel, Iulian, Chan, BT, Raghavan, Praveen, Blanco, Victor, Foubert, Philippe, D'urzo, Lucia, De Simone, Danilo, Vandenberghe,

Year:

2017

Language:

english

File:

PDF, 1.01 MB

english, 2017

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Improvement of EUV mix-match overlay for production implementation

Panning, Eric M., Goldberg, Kenneth A., Park, Sarohan, Lee, ByoungHoon, Lee, Byong-Seog, Lee, Inwhan, Lee, Chang-Moon

Year:

2016

Language:

english

File:

PDF, 845 KB

english, 2016

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner with improved overlay, imaging, and throughput

Panning, Eric M., Goldberg, Kenneth A., van de Kerkhof, Mark, Jasper, Hans, Levasier, Leon, Peeters, Rudy, van Es, Roderik, Bosker, Jan-Willem, Zdravkov, Alexander, Lenderink, Egbert, Evangelista, Fab

Year:

2017

Language:

english

File:

PDF, 1.65 MB

english, 2017

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - CD error caused by aberration and its possible compensation by optical proximity correction in extreme-ultraviolet lithography

Panning, Eric M., Goldberg, Kenneth A., Hwang, Jeong-gu, Kim, In-Seon, Kim, Guk-Jin, No, Hee-Ra, Kim, Byung-Hun, Oh, Hye-Keun

Year:

2017

Language:

english

File:

PDF, 2.14 MB

english, 2017

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Line-edge roughness (LER) performance targets for EUV lithography

Panning, Eric M., Goldberg, Kenneth A., Brunner, Timothy A., Chen, Xuemei, Gabor, Allen, Higgins, Craig, Sun, Lei, Mack, Chris A.

Year:

2017

Language:

english

File:

PDF, 679 KB

english, 2017

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Impact of non-uniform wrinkles for a multi-stack pellicle in EUV lithography

Panning, Eric M., Goldberg, Kenneth A., Kim, Guk-Jin, Kim, In-Seon, Yeung, Michael, Kim, Min-Su, Park, Jin-Goo, Oh, Hye-Keun

Year:

2017

Language:

english

File:

PDF, 870 KB

english, 2017

40

Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Naulleau, Patrick P., Goldberg, Kenneth A., Lee, Sang H., Chang, Chang, Attwood, David, Bokor, Jeffrey

Journal:

Year:

1999

Language:

english

File:

PDF, 6.44 MB

english, 1999

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Improvement of power, efficiency, and cost of ownership in the tin LPP EUV source

Panning, Eric M., Goldberg, Kenneth A., McGeoch, Malcolm W.

Year:

2017

Language:

english

File:

PDF, 563 KB

english, 2017

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Simulation and experimentation of PSCAR chemistry for complex structures

Panning, Eric M., Goldberg, Kenneth A., Carcasi, Michael A., Nagahara, Seiji, Shiraishi, Gosuke, Iseki, Tomohiro, Minekawa, Yukie, Yoshihara, Kosuke, Nakagawa, Hisashi, Naruoka, Takehiko, Nagai, Tomok

Year:

2017

Language:

english

File:

PDF, 8.13 MB

english, 2017

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Integrated approach to improving local CD uniformity in EUV patterning

Panning, Eric M., Goldberg, Kenneth A., Liang, Andrew, Hermans, Jan, Tran, Timothy, Viatkina, Katja, Liang, Chen-Wei, Ward, Brandon, Chuang, Steven, Yu, Jengyi, Harm, Greg, Vandereyken, Jelle, Rio, Da

Year:

2017

Language:

english

File:

PDF, 785 KB

english, 2017

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Considerations for pattern placement error correction toward 5nm node

Panning, Eric M., Goldberg, Kenneth A., Yaegashi, Hidetami, Oyama, Kenichi, Hara, Arisa, Natori, Sakurako, Yamauchi, Shohei, Yamato, Masatoshi, Koike, Kyohei, Maslow, Mark John, Timoshkov, Vadim, Kier

Year:

2017

Language:

english

File:

PDF, 4.16 MB

english, 2017

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV progress toward HVM readiness

Panning, Eric M., Goldberg, Kenneth A., Turkot, Britt, Carson, Steven L., Lio, Anna, Liang, Ted, Phillips, Mark, McCool, Brian, Stenehjem, Eric, Crimmins, Tim, Zhang, Guojing, Sivakumar, Sam

Year:

2016

Language:

english

File:

PDF, 1.95 MB

english, 2016

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Panning, Eric M., Goldberg, Kenneth A., Ko, Ki-Ho, Mo, Soo-Yeon, Kim, In-Seon, Oh, Hye-Keun

Year:

2016

Language:

english

File:

PDF, 1.22 MB

english, 2016

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Benchmarking study of EUV resists for NXE:3300B

Panning, Eric M., Goldberg, Kenneth A., Fan, Yu-Jen, Mellish, Mac, Chun, Jun Sung, McWilliams, Scott, Montgomery, Cecilia, Montgomery, Warren

Year:

2016

Language:

english

File:

PDF, 7.61 MB

english, 2016

48

Adaptive versus Veridical Decision Making and the Frontal Lobes

Elkhonon Goldberg, Kenneth Podell

Journal:

Consciousness and Cognition

Year:

1999

Language:

english

File:

PDF, 139 KB

english, 1999

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - 2D self-aligned via patterning strategy with EUV single-exposure in 3nm technology

Panning, Eric M., Goldberg, Kenneth A., Choi, Suhyeong, Lee, Jae Uk, Blanco Carballo, Victor M., Kim, Ryoung-Han, Shin, Youngsoo

Year:

2017

Language:

english

File:

PDF, 920 KB

english, 2017

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV implementation of assist features in contact patterns

Panning, Eric M., Goldberg, Kenneth A., Jiang, Fan, Raghunathan, Ananthan, Burkhardt, Martin, Saulnier, Nicole, Tritchkov, Alexander, Jayaram, Srividya, Word, James

Year:

2016

Language:

english

File:

PDF, 1.17 MB

english, 2016

To build up a library is to create a life. It’s never just a random collection of books.

— Carlos María Domínguez

Official channel

Z-Library Desktop Launcher

Z-Library Since 2009 support@1delivery.pm

EnglishРусскийEspañolItalianoελληνικάاللغة العربيةBahasa IndonesiaBahasa Malaysiaहिन्दीDeutschFrançaisPortuguêsУкраїнськаPolski中文繁體中文日本語Tiếng ViệtAzərbaycan DiliՀայոց լեզուภาษาไทยTürk Diliქართველიবাংলাپښتوతెలుగుاردو한국어SrpskiБългарски